A lithography mask, also known as a photomask or Mask Reticle, is a crucial component in the lithography process of micro-nano processing technology. This pattern master consists of a transparent substrate with an opaque light-shielding film that forms the mask pattern structure. The exposure process then transfers the pattern information to the product substrate. The use of lithography masks is essential in achieving precise and accurate production in the micro-nano processing realm. As such, it plays a critical role in the creation of cutting-edge technology that impacts various industries. This description highlights the significance of lithography masks and their impact on technology, making it an intriguing subject for those interested in innovation.
Product Introduction:
Our company specializes in the research and development of optical devices, with a strong focus on film photomask lithography products. These masks consist of glass/quartz substrates along with chromium and photoresist layers, and their pattern structures can be achieved through plate-making processes using advanced direct-writing lithography equipment, such as laser direct-writing lithography machines, and electron beam lithography machines.
Our film photomask lithography products are widely used in fields that involve lithography, such as IC (Integrated Circuit), FPD (Flat Panel Display), PCB (Printed Circuit Boards), and MEMS (Micro Electro Mechanical Systems), amongst others. We strive to provide the best possible service and user experience by allowing our customers to consult with our customer service team regarding any product needs that they may have.
Graphic data preparation is a crucial step in the mask processing stage, and we require our users to submit designs carefully for any necessary corrections to ensure the accuracy of the graphics. Our engineering team completes the processing technology after the user has submitted the graphic data.
About Our Company:
We at Ningbo Zhixing Optical Technology Co., Ltd. are a technology-based enterprise with a focus on providing best-in-class optical devices. Our key team members have graduated from renowned optoelectronic schools in China such as the Changchun Institute of Optics and Mechanics, Zhejiang University, and Beijing Institute of Technology.
We offer a variety of services, including optical system design, aspheric surface processing, and aspheric inspection tool (computational hologram, CGH) production, amongst others. Our company also has independent aspheric inspection tools with computational hologram (CGH) and intellectual property rights, surpassing the existing monopoly of foreign counterparts in this technology sector. Additionally, our team has maintained longstanding collaboration with many well-known enterprises at home and abroad while developing calibration boards.
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For inquiries about Machine Vision Calibration Board, Optical Glass Line Ruler, Photomask or price list, please leave your email to us and we will be in touch within 24 hours.
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