Soda Glass Photomask

Product Introduction: Our glass photomask lithography products are designed for use in various industries that require lithography, such as IC, FPD, PCB, MEMS, and more. The mask's pattern structure is obtained through a plate-making process utilizing direct-writing lithography equipment, including laser direct-writing lithography machines and electron beam lithography machines. The mask is made up of a glass/quartz substrate, a chromium layer, and a photoresist layer. Crafting Process: The process to create our glass photomask lithography products involves drawing a mask reticle layout file that the generation device can recognize. Afterward, our maskless lithography machines read the layout file to perform non-contact exposure to the blank reticle with glue using 405nm wavelength illumination. The illuminated area undergoes a photochemical reaction with the required pattern area to dissolve and fall off the photoresist in the exposed area, exposing the underlying chromium layer. Subsequently, we use chromium etching solution for wet etching to etch the exposed chromium layer, forming a light-transmitting area. Then, the photoresist that protects the chromium layer is removed using wet or dry methods, forming an opaque area. The result is a mask with plane pattern structures of varying light transmittances, ideal for the specific application requirements in various industries. Exhibition and Company Profile: Ningbo Zhixing Optical Technology Co., Ltd. is a technology-based enterprise that focuses on the research and development of optical devices. Our founder graduated from Changchun Institute of Optics and Mechanics, Chinese Academy of Sciences, while our core R&D team includes graduates from famous optoelectronic schools like Changchun Institute of Optics and Mechanics, Zhejiang University, Beijing Institute of Technology, and more. We can complete optical system design, aspheric surface processing, aspheric inspection tool (computational hologram, CGH) production, machine vision calibration board development, and other customized needs according to customer requirements. We possess independent aspheric inspection tools (computational hologram, CGH) that give us intellectual property rights, breaking the monopoly of foreign counterparts in this technology. Furthermore, we maintain long-term cooperation with many well-known enterprises, both locally and globally, during the development of calibration boards. We believe in providing high-quality glass photomask lithography products that fulfill the specific requirements of a wide range of industries.